国产睡熟迷奷系列网站,欧美激情一级精品国产,欧美高清在线观看一区二区,欧美黄片一区二区视频


免費(fèi)注冊(cè)快速求購(gòu)


分享
舉報(bào) 評(píng)價(jià)

Kurt J.Lesker原子層沉積ALD150LX™

參考價(jià)面議
具體成交價(jià)以合同協(xié)議為準(zhǔn)
  • 公司名稱 武漢茂迪科技有限公司
  • 品牌
  • 型號(hào)
  • 所在地 武漢市
  • 廠商性質(zhì) 其他
  • 更新時(shí)間 2024/2/14 17:06:00
  • 訪問(wèn)次數(shù) 19

該廠商其他產(chǎn)品

我也要出現(xiàn)在這里

OverviewTheKurtJ

詳細(xì)信息 在線詢價(jià)

Overview

The Kurt J. Lesker Company® (KJLC®) ALD150LX™ is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. Innovative ALD150LX™ design features, like our Patented Precursor Focusing Technology™, blended with advanced process capability provide unparalleled flexibility and performance. With an emphasis on enabling and supporting innovative, cutting edge technology at the R&D level, the ALD150LX™ serves not only as a stand-alone platform, but provides connectivity with additional process and analysis modules in a cluster tool configuration.

ALD150LX™ cluster tool connectivity eliminates unwanted atmosphere exposure between critical process and analysis steps to protect sensitive surfaces, layers and their interfaces. This connectivity includes the integration of additional ALD and analysis modules, as well as other KJLC® thin film deposition technologies for multi-technique process and analysis capability and support that are second-to-none in the industry. Combined quality, flexibility and performance, as well as multi-technique process and analysis capability make the ALD150LX™ an innovative, best-in-class design.

Technical Description

Process Chamber

  • Thermal or plasma-enhanced (PEALD) configurations
  • Perpendicular flow design
  • Four separate chamber inlets for precursor delivery (not including plasma)
  • Analytical ports for in-situ ellipsometry
  • Horizontal substrate loading port (up to 150 mm diameter substrates)
  • Independent substrate heater stage

Precursors

  • High-performance, remote inductively coupled plasma (ICP) source with up to six plasma gas lines
  • Up to fifteen precursor sources with four separate chamber inlets (not including plasma)
  • Variety of precursor delivery options are available including vapor draw, flow-through and pulsed gas delivery
  • Exposure modes include dynamic, static and Variable Residence Mode™ (VRM™)
  • Ozone source

Typical Processes

  • Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZrO2, HZO, ZnO, AZO, AIN, TiN, GaN, Pt, and Ru

System Heating

  • Independent substrate heater stage capable of up to 500°C operation
  • Process chamber and precursor delivery line heating up to 250°C
  • Precursor heating up to 200°C
  • Delivery Line heating up to 250°C
  • Up to 200°C Valve Heating

Software & Controls

  • KJLC® eKLipse™ system control software (LabView based)
  • Real time controller
  • True precision ALD valve timing

Process Pump

  • Rotary vane pump (53 cfm) with foreline purge/vent protection and oil filtration
  • Dry pump
  • Customer supplied process pump

Substrate Transfer

  • Manual loading
  • Load-Lock (single or multi-wafer cassette)
  • Cluster Tool
  • Glove Box





同類產(chǎn)品推薦


提示

×

*您想獲取產(chǎn)品的資料:

以上可多選,勾選其他,可自行輸入要求

個(gè)人信息:

久久久久久精品无码免费看| 一区二区不卡99精品日韩| 日本边添边摸边做边爱喷水| 国内精品久久久久久久久久久| 亚洲另类欧美在线中文字幕不卡| 久久久久久三区二区精品| 日本一区二区三区综合| 久久久高清免费精品视频| 日韩精品视频在线观看一区二区三区| 久久婷婷综合激情亚洲狠狠| 亚洲精品国产精品系列| 亚洲中文字幕在线视频一区| 丰满的大乳老师三级在线观看| 亚洲av无码网站yw尤物| 国产精品久久久久九九九九不卡| 人妻少妇精品视频无码专区| 亚洲综合激情另类小说区| 日本韩国亚洲欧美一区二区三区| 女人之爱女同电影中文字幕| 久久久久无码精品国产app| 国产亚洲欧美另类网爆在线| 好看的福利电影在线| 久久99老妇伦国产熟女高清| 亚洲欧美另类色视频| 国产一区二区日本在线观看| 日本色一区二区三区四区五区| 亚洲欧美国产其他二区| 亚洲国产精品91网| 美女草草影院在线观看视频| 国产在线一区二区三区欧美| 日韩无打码一区二区三区| 亚洲日韩欧美制服第一页| 欧美综合亚洲日韩精品区| 亚洲国产精品久久久久av| 亚洲视频专区一区二区| 美女草草影院在线观看视频| 中文精品久久久久国产网址| 日本无人区一区二区三区| 国产精品欧美激情青草| 韩国三级大尺度床戏网站| 免费在线观看一本视频|