小型LB膜分析儀
除了卷對(duì)卷式柔性LB膜分析儀，我們還有傳統(tǒng)的小型LB膜分析儀，可實(shí)現(xiàn)LB膜的分析與沉積。LB膜槽子面積小，樣品少，基片小，采用垂直鍍膜方法。
型號(hào)為L(zhǎng)T-111，Minitrough 小型LB膜分析儀
性?xún)r(jià)比高，僅需1.5萬(wàn)歐元（不同配置略有增減）。
卷對(duì)卷式柔性LB膜分析儀儀器是一種多功能的LB莫分析儀，具有柔性鍍膜，剛性鍍膜，垂直鍍膜，水平鍍膜功能。
卷對(duì)卷式柔性LB膜分析儀儀器用于在較長(zhǎng)的柔性基底（如保鮮膜式柔性帶狀基底）上連續(xù)沉積單分子薄膜，也可把大尺寸剛性襯底粘接在皮帶上進(jìn)行鍍膜，可進(jìn)行無(wú)限多次LB薄膜沉積，可控制柔性基底順時(shí)針或逆時(shí)針旋轉(zhuǎn)，沉積X,Y,Z多種類(lèi)型的LB薄膜結(jié)構(gòu)。同時(shí)具備垂直鍍膜與水平鍍膜功能。襯底可以是卷式鋁箔、卷式PET塑料薄膜等。設(shè)備包含鍍膜槽，卷對(duì)卷樣品傳動(dòng)裝置，卷對(duì)卷轉(zhuǎn)動(dòng)滑障與水平移動(dòng)滑障，表面壓探頭與鍍膜頭，自動(dòng)進(jìn)樣裝置：注射泵與蠕動(dòng)泵，控制器，電腦。
卷對(duì)卷式柔性LB膜分析儀液體界面單分子薄膜鍍膜儀器可進(jìn)行無(wú)限多次薄膜沉積，可控制柔性基底順時(shí)針或逆時(shí)針旋轉(zhuǎn)，沉積x、y、z型結(jié)構(gòu)的薄膜。
小型LB膜分析儀技術(shù)指標(biāo)：
滑障控制有效面積范圍：128+2 cm2-440+1 cm2
基底尺寸范圍：125х125x4 mm (h-w-t)
鍍膜井尺寸：200x180x200 mm (w-d-h)
表面壓傳感器：靈敏度0.01 mN/m，測(cè)量范圍0-80 mN/m。
小型LB膜分析儀Langmuir–Blodgett trough ‘LT-111’ is intended
for application of monomolecular films on solid samples according to the Langmuir–Blodgett (LB) technique and for deposition of multimolecular films by corresponding layer-by-layer technique;
for measurement of compression isotherms (without limitation in number of surfactants in multicomponent mixtures);
for application of monomolecular films on solid samples according to the horizontal precipitation (HP) technique;
for experiments on construction mono- and mulimolecular composite coatings on solid surface;
for altering the surface properties (hydrophylic, optical, electrical etc. behavior);
for fundamental research at production of ultrathin films and their application as insulating and protective coatings, elements of molecular electronics, in biological studies for creation of analogs for bilayer lipid membranes etc..
This version features extra-wide dipping well suitable for flat samples of diameter up to 125 mm. That allows experimentation with, for example, silicon wafers directly.
FEATURES
小型LB膜分析儀技術(shù)參數(shù)：
Number of barriers: | One |
Velocity range of the barrier motion: | 54–210 mm/min (single side comression) |
Full free surface area: | 463+1 cm2 |
Maximum free surface area confined with the barrier: | 440+1 cm2 |
Minimum free surface area confined with the barrier: | 128+2 cm2 |
Compressed (effective) area: | 312 cm2 |
Liquid medium volume: | 1000-1030 cm3 |
Dipping well: | depth 110 mm, widht 130 mm |
Maximum dimensions of the immersed substrate: | 125х125x4 mm (h-w-t) |
Delay between the layers deposition: | 0–100000 s |
Dipper mechanism stroke: | 85 mm (vertical position of the unit can be adjusted manually) |
Dipper mechanism velocity range: | 0.12–70 mm/min, step of the velocity change 0.1 mm/min |
Deposition rate: | 0.002 to 2 mm/min |
Surface tension sensor: | Wilhelmy plate 2 cm2, accuracy ~0.1 mN/m (vertical position of the sensor can be adjusted manually) |
Number of surafce tension sensors: | One |
Sensitivity of the surface tension sensor: | 0.05 mN/m |
Working range of the surface tension sensor: | 0-80 mN/m (stepped and fine adjustment of the range are available) |
Overall dimensions: | Trough with mounted rig - 400x200x250 mm (w-d-h); Control unit - 220x165x105 mm (w-d-h); Weight 7/8 kg. |
Supply voltage: | 220 V 50 Hz |
Power consumption: | not more than 40 W |
Additional accessories: | Substrate clamping holder for fixing the sample on the dipper lever. Rig for film application by the horizontal precipitation method (by liquid medium draining). Base slab suitable for liquid thermostating by outer source (not included).
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TECHNIQUES
卷對(duì)卷式LB膜分析儀技術(shù)：
| Deposition of X-type LB film | 
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| Deposition of Y-type LB film | 
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| Deposition of Z-type LB film | 
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| Horizontal precipitation (HP) method (by liquid medium draining) provides surface modification by extremely uniform and homogenous monolayer films (see, for examplethis paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3-5 minutes. | 
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| Roll-To-Roll deposition technique engages additional accessories in the set of LB trough LT-310 to deposit monomolecular film on tape (continuous deposition on flexible substrate). In LT-310, extraction angle of the exiting portion of tape may be adjusted in range 30-90owith step 5o | 
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卷對(duì)卷式柔性LB膜分析儀實(shí)驗(yàn)數(shù)據(jù)：
1. SEM images of the monolayer of silica spheres D1 = 250 nm (a, b) and D2 = 550 nm (c?f) deposited on the PET film using the roll-to-roll LB method. * from M. Parchine, J. McGrath, M. Bardosova, M. E. Pemble,Large Area 2D and 3D Colloidal Photonic Crystals Fabricated by a Roll-to-Roll Langmuir–Blodgett Method, Langmuir,32, 5862 (2016)
2、AFM-images of bi-componentLB-film ofPMMA/DPPC on PETP-tape
(Roll-to-roll technique, p=30 mN/m)，(a) topographic mode, (b) friction mode
* By Dr. G.K. Zhavnerko etc.
