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粉末與顆粒鍍膜原子層沉積系統(tǒng)-Powder ALD-研發(fā)與生產(chǎn)型

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  • 公司名稱 北京伯英科技有限公司
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  • 所在地 北京市
  • 廠商性質(zhì) 其他
  • 更新時(shí)間 2025/2/24 10:25:33
  • 訪問次數(shù) 2

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粉末原子層沉積系統(tǒng)ALD美國(guó)ALDNANOSOLUTIONS公司技術(shù)，專注于粉末顆粒表面鍍膜

詳細(xì)信息 在線詢價(jià)

粉末原子層沉積系統(tǒng) ALD

美國(guó)ALD NANOSOLUTIONS公司技術(shù)，專注于粉末顆粒表面鍍膜。


專用于在粉末、顆粒表面沉積ALD薄膜，可用于科研，生產(chǎn)。單批次體積從45ml~150L，滿足科研到生產(chǎn)的需要?？沙练e氧化物，氮化物，金屬等類型薄膜?？捎糜阡囯x子電池、催化劑、等需要粉末鍍膜的行業(yè)。

專業(yè)的粉末鍍膜原子層沉積系統(tǒng)，為科研與生產(chǎn)提供專業(yè)的解決方案。


設(shè)備沉積方法有：流化床法、滾動(dòng)法、振動(dòng)法。


粉末原子層沉積系統(tǒng)型號(hào):

FX系列：75 or 150 mL，適用于R&D

FP系列:  500 mL / 2 L / 5 L / 10 L，適用于R&D，生產(chǎn)

RX系列：10 or 40 mL， 適用于R&D 

RP系列： ~40L, 適用于生產(chǎn)

CVR系列：15L/hr to 150L/hr，適用于生產(chǎn)



粉末原子層沉積系統(tǒng)技術(shù)參數(shù)：

ALD REACTOR SYSTEMS

Fluidized
    Bed Reactors
    (FBR)

Rotary Reactors (Rotary)

Continuous Vibrating Reactors (CVR)

Substrate Volume

75mL to 10L per batch

10ml to 40L

15L/hr to 150L/hr

Substrate Mass
    (Density Dependent)

75g - 12.5kg per batch

10g - 50kg per batch

15kg/hr to 150kg/hr

Vapor Draw Sources

2 standard,
    up to 8

2 standard,
    up to 8

2 standard,
    up to 8

Regulatory Compliance

CE, GMP and ISO compliance upon request

Weight

300 lbs -
    1,000 lbs (150kg - 500kg)

300lbs - 4,000lb (150kg
    - 2000kg)

500lbs - 8,000lb (250kg - 4000kg)

Venting  Emissions and   Abatement

Equipment can be designed to comply with local jurisdiction   codes and regulations

Electrical Requirements

Project-specific and customized. Further details can be   supplied upon request

Demonstrated Particle Diameters

10 nm - 500micron

10 nm - 200micron

5-50micron

Potential  Particle   Diameters

2 nm - 1mm

2 nm - 250px

10nm - 1 cm

Other Features

Highest Precursor Efficiency

Plasma ALD Compatible

Atmospheric Pressure Operation


Fluidization Reactor – Experimental Series (FX)

Reactor Style:

Fluidization Reactor

Substrate Volume:

75 or 150 mL

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 4

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading

Low Vapor Pressure Containers capable of   150 °C

Residual Gas Analyzer

Waste Abatement

Glovebox

Research License for ALD on Particles

Various Vapor Sources


Fluidization Reactor – Pilot Series (FP)

Reactor Style:

Fluidization Reactor

Substrate Volume:

500 mL / 2 L / 5 L / 10 L

Reactor Temperatures Range:

25 – 450 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

400 lbs/ 180 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Research License for ALD on Particles

Various Vapor Sources

Rotary ALD Reactor – Pilot Series (RP)

Reactor Style:

Rotary Reactor

Substrate Volume:

~40 L

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

500 lbs/ 230 kg

Options Available:

Substrate Loading


Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources

 

Rotary ALD Reactor – Experimental Series (RX)


Reactor Style:

Rotary Reactor

Substrate Volume:

10 or 40 mL

Reactor Temperatures Range:

25 – 200 °C

Maximum Process Line Temperatures:

200 °C

Vapor Draw Sources:

2 standard, up to 8

Dosing Valves:

Heated Metal Diaphragm

Vacuum Pump:

Rotary Vane (9 CFM or greater)

Regulatory Compliance:

CE Marked

Weight:

300 lbs/ 140 kg

Options Available:

Substrate Loading


Plasma Source from Meaglow

Low Vapor Pressure Containers capable of 150 °C

Residual Gas Analyzer

Waste Abatement

Integrated Glovebox

Research License for ALD on Particles

Various Vapor Sources





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