SD-160型離子濺射儀是采用二級(jí)（DC）直流濺射原理設(shè)計(jì)而成的離子濺射鍍膜設(shè)備。二極（DC）直流濺射是一種、可靠、經(jīng)濟(jì)的鍍膜技術(shù)，是許多廠商提供的離子濺射儀的基礎(chǔ)。除了具有通常的基本結(jié)構(gòu)外，它的特點(diǎn)是：配置有樣品濺室，真空顯示表、濺射電流指示表、濺射電流調(diào)整控制器、微型真空閥、定時(shí)器。工作時(shí)結(jié)合內(nèi)部自動(dòng)控制電路很容易控制真空室壓強(qiáng)、電離電流及選擇所需的電離氣體，獲得鍍膜效果。特殊設(shè)計(jì)的鐘罩邊緣橡膠密封圈，可保證*使用不會(huì)出現(xiàn)影響樣品濺射室真空度的玻璃鐘罩“崩邊”現(xiàn)象；陶瓷密封高壓頭比通常采用的橡膠密封更經(jīng)久耐用。根據(jù)電場(chǎng)中氣體電離特性，采用大容量樣品濺射真空室和相應(yīng)面積濺射靶，使濺射鍍層更均勻潔凈。此外SD-160應(yīng)用高穩(wěn)定性、高靈敏 度電磁閥，采用雙氣路自動(dòng)控制系統(tǒng)，更 易實(shí)現(xiàn)對(duì)樣品的保護(hù)以及對(duì)樣品成膜品質(zhì) 的保證。特別適用于電鏡實(shí)驗(yàn)室的SEM樣品制備和新材料研究的電極制作。
配有高位定性的飛躍真空泵
"The SD-160 type ion sputtering apparatus is designed by means of the two stage (DC) DC sputtering principle. DC (DC) sputtering is the simplest, reliable and economical coating technology, and is the foundation of many manufacturers.
In addition to its usual basic structure, SD-160 is characterized by the configuration of a sample splash, a vacuum display table, a sputtering current indicator, a sputtering current adjustment controller, a miniature vacuum valve, and a timer. It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect. Specially designed bell ring rubber seal ring,
It is guaranteed that the long term use of glass clocks, which will not affect the vacuum of the sample sputter room, is "disintegrating"; the ceramic sealing high pressure head is more durable than the usual rubber seal. According to the ionization characteristics of the gas in the electric field, the large volume sample sputtering chamber and the corresponding area sputtering target are used to make the sputtering coating more uniform and clean.
In addition, SD-160 uses high stability, high sensitivity solenoid valve and dual gas automatic control system. It is easier to protect the sample and guarantee the quality of film forming. It is especially suitable for SEM sample preparation in electron microscope laboratory and electrode preparation for new material research.
High qualitative jump vacuum pump"
濺射氣體
| 濺射靶材 | 濺射電流 | 濺射速率 | 樣品倉(cāng)尺寸 | 樣品臺(tái)尺寸 | 工作電壓 |
| 根據(jù)實(shí)驗(yàn)?zāi)康目商砑託鍤?，氮?dú)獾榷喾N氣體。 | 標(biāo)配靶材為金靶，厚度為50mm*0.1mm。也可根據(jù)實(shí)際情況配備銀靶、鉑靶等。 | *電流 50mA,*工作電流30mA | 優(yōu)于4nm/min | 直徑160mm，高120mm | 樣品臺(tái)尺寸可安裝直徑50mm和直徑70mm的樣品臺(tái)，也可根據(jù)自身要求定制樣品臺(tái) | 220V (可做110V), 50HZ |
需要鍍膜的樣品
| 電子束敏感的樣品 | 非導(dǎo)電的樣品 | 新材料 |
| 主要包括生物樣品，塑料樣品等。S EM中的電子束具有較高能量，在與樣品的相互作用過(guò)程中，它以熱的形式將部分能量傳遞給樣品。如果樣品是對(duì)電子束敏感的材料，那這種相互作用會(huì)破壞部分甚至整個(gè)樣品結(jié)構(gòu)。這種情況下，用一種非電子束敏感材料制備的表面鍍層就可以起到保護(hù)層的作用，防止此類損傷； | 由于樣品不導(dǎo)電，其表面帶有“電子陷阱”，這種表面上的電子積累被稱為“充電”。為了消除荷電效應(yīng)，可在樣品表面鍍一層金屬導(dǎo)電層，鍍層作為一個(gè)導(dǎo)電通道，將充電電子從材料表面轉(zhuǎn)移走，消除荷電效應(yīng)。在掃描電鏡成像時(shí)，濺射材料增加信噪比，從而獲得更好的成像質(zhì)量。 | 非導(dǎo)電材料實(shí)驗(yàn)電極制作觀察導(dǎo)電特性 |
