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| Device | Base Price |
| Ultra-High Resolution Soft X-Ray Calibration Standard (70 nm Au) (15 nm half pitch) | USD $5000 |
| Soft X-Ray Calibration Standard (200 nm Au) (20 nm half pitch or better) | USD $4500 |
| Hard X-Ray Calibration Standard (>600 nm Au) (25 nm half-pitch or better) | USD $6000 |
| Features Include: ? Nested L’s ? Siemen star patterns (large and small) ? Varying pitch gratings and meshe ? Nano USAF 1951 | |
| Customization | Extra Fee |
| ? Custom Logo (Max 50 µm 2 area) | $1000 |
| ? Low stress 50 nm silicon nitride membrane | $2000 |
| ? Low stress 100 nm silicon carbide membrane | $2500 |
| ? Fused Silica Substrate (~500 um thick) Chrome metal on glass (positive tone-only) | $2500 |
Negative polarity (features transparent) ? 30 nm minimum feature size (soft X-ray) ? 50 nm minimum feature size (hard X-ray) | $1250 |
| ? Custom chip sizes | Contact us |
校準標準在標準的5 mm x 5 mm框架上于堅固的低應力氮化硅膜上制造。 熔融石英基板可用于具有鉻特征的光學顯微鏡。
校準標準在標準的5 mm x 5 mm框架上于堅固的低應力氮化硅膜上制造。
熔融石英基板可用于具有鉻特征的光學顯微鏡
高分辨率ANT徽標，20納米特征，電鍍至200納米
注：終設計可能不*如圖所示。
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